METHOD OF MANUFACTURING COPPER WIRING INSULATION FILM, AND COPPER WIRING INSULATION FILM MANUFACTURED FROM THE SAME

PROBLEM TO BE SOLVED: To provide an unprecedented method of manufacturing a copper wiring insulation film capable of forming a fine wiring which has excellent bondability between a copper foil and an insulation film and is excellent in linearity by using a semi-additive method while using an ultra-f...

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Bibliographische Detailangaben
Hauptverfasser: YOKOZAWA YOSHIHIRO, NARUI KOJI, SHIMOKAWA HIROTO, BANBA KEITA
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide an unprecedented method of manufacturing a copper wiring insulation film capable of forming a fine wiring which has excellent bondability between a copper foil and an insulation film and is excellent in linearity by using a semi-additive method while using an ultra-fine copper foil laminate insulation film, and is excellent in circuit visibility. SOLUTION: The method for manufacturing a copper wiring insulation film by a semi-additive method uses a copper foil laminate insulation film in which a copper foil is laminated on a single surface or both surfaces of an insulation film, wherein the copper foil laminate insulation film is obtained by laminating a copper foil having following features (a) and (b) to the insulation film. COPYRIGHT: (C)2009,JPO&INPIT