SUPPORTING SYSTEM FOR SEMICONDUCTOR MANUFACTURING

PROBLEM TO BE SOLVED: To provide a supporting system for the semiconductor manufacturing, which manufactures semiconductor devices with a high yield by reducing a variation in the electric properties and machining dimensions of semiconductor devices. SOLUTION: This supporting system for the semicond...

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Bibliographische Detailangaben
Hauptverfasser: FUJIWARA SHOICHIRO, YAMAMOTO KEIZO, SAKAI KATSUNAO, ARAI HIROMASA
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a supporting system for the semiconductor manufacturing, which manufactures semiconductor devices with a high yield by reducing a variation in the electric properties and machining dimensions of semiconductor devices. SOLUTION: This supporting system for the semiconductor manufacturing is equipped with a feedback part 111 renewing a relational expression of measured data between a process and the last process of a processing apparatus and renewing a controlling parameter of the last process of the processing apparatus, based on a change amount of the processing apparatus calculated by obtaining measured data of a layer on a material substrate which has been processed by the processing apparatus and by calculating a change amount of the processing apparatus. COPYRIGHT: (C)2009,JPO&INPIT