ELECTRON BEAM DRAWING DEVICE AND TRAY

PROBLEM TO BE SOLVED: To accurately measure displacement of a substrate tray with a substrate mounted thereon. SOLUTION: A smooth reflection surface is formed on a side surface of the substrate tray 40 holding the substrate W by mirror finishing, for example. Thereby, high reflectance to laser beams...

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Bibliographische Detailangaben
1. Verfasser:	MURAYAMA NOBORU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To accurately measure displacement of a substrate tray with a substrate mounted thereon. SOLUTION: A smooth reflection surface is formed on a side surface of the substrate tray 40 holding the substrate W by mirror finishing, for example. Thereby, high reflectance to laser beams LB1x, LB2X, LB1y and LB2y from a light source 62 can be secured and the position of the substrate tray 40 in an XY plane can be accurately measured. By deflecting an electron beam using the measurement result, misalignment (change) of a radiation position caused by positional change can be suppressed and a pattern can be accurately drawn on the surface of the substrate W. COPYRIGHT: (C)2009,JPO&INPIT