RADIATION-SENSITIVE RESIN COMPOSITION, SPACER AND PROTECTIVE FILM FOR LIQUID CRYSTAL DISPLAY ELEMENT, AND METHOD FOR FORMING THEM

PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which has high radiation sensitivity and is capable of forming a patterned thin film that is superior in dimensional accuracy and strength, even under low exposure energy, free of pattern peel-off in a developing step and a rub...

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1. Verfasser:	HAMAGUCHI HITOSHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTROGRAPHY FREQUENCY-CHANGING HOLOGRAPHY MATERIALS THEREFOR NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICAL LOGIC ELEMENTS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which has high radiation sensitivity and is capable of forming a patterned thin film that is superior in dimensional accuracy and strength, even under low exposure energy, free of pattern peel-off in a developing step and a rubbing step, having heat resistance that withstands baking temperature, in the formation of a liquid crystal alignment layer, superior in resistance to a liquid crystal alignment layer stripping solution, and not causing "burn-in", and which will not generate sublimates in a heating step. SOLUTION: The radiation-sensitive resin composition includes (A) a polymer, having at least one group selected from the group, consisting of a carboxyl group and acid anhydride groups and a polymerizable unsaturated bond within a molecule; (B) a monomer having a polymerizable unsaturated bond; (C) a radiation-sensitive polymerization initiator; and (D) a compound having an N-substituted oxydicarboxyimide structure. COPYRIGHT: (C)2009,JPO&INPIT