INDIUM TIN OXIDE TARGET, METHOD FOR MANUFACTURING THE SAME, TRANSPARENT CONDUCTIVE FILM OF INDIUM TIN OXIDE, AND METHOD FOR MANUFACTURING THE SAME

PROBLEM TO BE SOLVED: To provide an indium tin oxide target, a method for manufacturing the indium tin oxide target, a transparent conductive film of indium tin oxide, and a method for manufacturing the transparent conductive film. SOLUTION: The indium tin oxide target includes at least one oxide se...

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Hauptverfasser:	PARK JU OK, PARK KEIRITSU, SAI SEIRYU, SAI CHURETSU, KOO BON KYUNG, PARK JOON HONG, KIM GENSHU, IN KANKO, SONG PUNG KEUN
Format:	Patent
Sprache:	eng
Schlagworte:	ARTIFICIAL STONE BASIC ELECTRIC ELEMENTS CABLES CEMENTS CERAMICS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS CONCRETE CONDUCTORS DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INSULATORS LIME, MAGNESIA METALLURGY REFRACTORIES SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES SLAG SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TREATMENT OF NATURAL STONE
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an indium tin oxide target, a method for manufacturing the indium tin oxide target, a transparent conductive film of indium tin oxide, and a method for manufacturing the transparent conductive film. SOLUTION: The indium tin oxide target includes at least one oxide selected from the group consisting of samarium oxide and ytterbium oxide, wherein an amount of the oxide is 0.5 wt.% to 10 wt.% based on the weight of the target. COPYRIGHT: (C)2009,JPO&INPIT