LITHOGRAPHIC APPARATUS, ILLUMINATION SYSTEM AND METHOD FOR PROVIDING PROJECTION BEAM OF EUV RADIATION

PROBLEM TO BE SOLVED: To provide a lithographic apparatus which is not influenced by a problem caused by particles produced as a by-product of the EUV radiation production. SOLUTION: The lithographic apparatus includes an illumination system that provides a beam of radiation and a support structure...

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Bibliographische Detailangaben
Hauptverfasser:	IVANOV VLADIMIR VITALEVICH, BANINE VADIM YEVGENYEVICH, KOSHELEV KONSTANTIN NIKOLAEVITCH
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY GAMMA RAY OR X-RAY MICROSCOPES HOLOGRAPHY IRRADIATION DEVICES MATERIALS THEREFOR NUCLEAR ENGINEERING NUCLEAR PHYSICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR X-RAY TECHNIQUE
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a lithographic apparatus which is not influenced by a problem caused by particles produced as a by-product of the EUV radiation production. SOLUTION: The lithographic apparatus includes an illumination system that provides a beam of radiation and a support structure that supports a patterning structure. The patterning structure is configured to impart a pattern to the beam of radiation in its cross-section. The apparatus also includes a substrate support that supports a substrate and a projection system that projects the patterned beam onto a target portion of the substrate. The illumination system includes a radiation-production system that produces extreme ultra-violet radiation and a radiation-collection system that collects extreme ultra-violet radiation. Particles that are produced as a by-product of extreme ultra-violet radiation production move substantially in a particle-movement direction. The radiation-collection system is adjusted to collect extreme ultra-violet radiation which radiates in a collection-direction, which is substantially different from the particle-movement direction. COPYRIGHT: (C)2009,JPO&INPIT