TRANSFER FILM FOR FORMING METALLIC PATTERN AND METHOD OF FORMING METALLIC PATTERN

PROBLEM TO BE SOLVED: To provide a transfer film for forming a metallic pattern and a method of forming the metallic pattern, by which a low resistance electrode is manufactured, transparency of a flat panel display (FPD) is maintained and stripping of a metal foil from a glass paste layer is interc...

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Bibliographische Detailangaben
Hauptverfasser: KAWAGISHI SEIJI, KUWATA HIROAKI, YAMASHITA TAKANORI, INOUE YASUTAKE
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a transfer film for forming a metallic pattern and a method of forming the metallic pattern, by which a low resistance electrode is manufactured, transparency of a flat panel display (FPD) is maintained and stripping of a metal foil from a glass paste layer is intercepted in a developing step, and disengagement of a resist layer from the metal foil is prevented in an etching step. SOLUTION: The transfer film for forming the metallic pattern is formed by laminating the resist layer, a metallic layer having 1-20 μm thickness and the glass paste layer on a support film in this order, wherein the glass paste layer contains glass powder and a binder resin having ≤5 mass% structural component derived from a monomer having a hydrophilic group. The method of forming the metallic pattern by forming these layers is disclosed. COPYRIGHT: (C)2009,JPO&INPIT