TREATMENT STAGE

PROBLEM TO BE SOLVED: To provide a treatment stage which has excellent positional accuracy and suitably treats a substrate as a treatment target. SOLUTION: A treatment stage 100 comprises a moving member 20 having a mount surface for a treatment substrate to be mounted thereon, a treatment section 5...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: TANAKA HISATO, INOUE YUYA, TANIFUJI TAMOTSU
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a treatment stage which has excellent positional accuracy and suitably treats a substrate as a treatment target. SOLUTION: A treatment stage 100 comprises a moving member 20 having a mount surface for a treatment substrate to be mounted thereon, a treatment section 50 in which a treatment device for performing predetermined treatment on the treatment substrate is installed, a position control means for changing a relative position between the moving member 20 and the treatment section 50, and a substrate hoisting or lowering mechanism 30 for hoisting or lowering the treatment substrate between the mounted surface and a position higher than the mounted surface. The position control means has first rails 10 extended in a first direction and a first direction control means for moving the moving member 20 on the first rails 10 independently of the substrate hoisting or lowering mechanism 30. COPYRIGHT: (C)2009,JPO&INPIT