HYDROGEN CHLORIDE GAS EJECTING NOZZLE, REACTION APPARATUS FOR PRODUCING TRICHLOROSILANE, AND METHOD FOR PRODUCING TRICHLOROSILANE

PROBLEM TO BE SOLVED: To provide a hydrogen chloride gas ejecting nozzle member capable of suppressing clogging by metal silicon powder and capable of enhancing production efficiency of trichlorosilane by widely dispersing hydrogen chloride gas. SOLUTION: The hydrogen chloride gas ejecting nozzle me...

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1. Verfasser: INABA TSUTOMU
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a hydrogen chloride gas ejecting nozzle member capable of suppressing clogging by metal silicon powder and capable of enhancing production efficiency of trichlorosilane by widely dispersing hydrogen chloride gas. SOLUTION: The hydrogen chloride gas ejecting nozzle member 1 is used in a reaction apparatus for producing trichlorosilane in which metal silicon powder is reacted with hydrogen chloride gas to generate trichlorosilane. The member 1 is provided with a shaft portion 2 extending in the longitudinal direction and a head portion 3 extending in a direction intersecting the longitudinal direction of the shaft portion 2. A supply hole 4 extending in the longitudinal direction is formed in the shaft portion 2, a plurality of ejection holes 5 are formed in the head portion 3, and each of the ejection holes 5 is communicatively connected to the supply hole 4 and opened on the outer surface of the head portion 3 toward a direction intersecting the direction to which the supply hole 4 extends. COPYRIGHT: (C)2009,JPO&INPIT