ETCHING MASK, BASE MATERIAL WITH ETCHING MASK, FINE WORKPIECE, METHOD OF MANUFACTURING FINE WORKPIECE

PROBLEM TO BE SOLVED: To provide an etching mask excelling in thermal imprinting property and etching resistance, and a base material with the etching mask, a fine workpiece and its manufacturing method. SOLUTION: The etching mask is formed of thermoplastic resin containing at least one kind of ring...

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Bibliographische Detailangaben
Hauptverfasser:	MITRA ANUPAM, TAKATANI YOSHITERU, KUSUURA TAKAHISA, HAYASHIDA YOSHIHISA, SAZUKA TAKUO
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING BASIC ELECTRIC ELEMENTS CHEMISTRY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS PERFORMING OPERATIONS SEMICONDUCTOR DEVICES SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS THEIR PREPARATION OR CHEMICAL WORKING-UP TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an etching mask excelling in thermal imprinting property and etching resistance, and a base material with the etching mask, a fine workpiece and its manufacturing method. SOLUTION: The etching mask is formed of thermoplastic resin containing at least one kind of ring-opening polymer of specific cyclic olefine, or its hydride. COPYRIGHT: (C)2009,JPO&INPIT