COMPOSITION FOR FILM FORMING AND SILICA-BASED FILM

PROBLEM TO BE SOLVED: To provide a composition for film forming which is hardly changed during storage and to provide a silica-based film made from the composition. SOLUTION: The film forming composition comprises a polycarbosilane having a main chain comprising a silicon atom and a carbon atom bein...

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Bibliographische Detailangaben
Hauptverfasser:	NOBE YOHEI, ISHIZUKI KENJI, SUMIYA KOJI, NAKAGAWA YASUSHI
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES BASIC ELECTRIC ELEMENTS CHEMICAL PAINT OR INK REMOVERS CHEMISTRY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS CORRECTING FLUIDS DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FILLING PASTES INKS MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC MACROMOLECULAR COMPOUNDS PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING POLISHES SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS USE OF MATERIALS THEREFOR WOODSTAINS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a composition for film forming which is hardly changed during storage and to provide a silica-based film made from the composition. SOLUTION: The film forming composition comprises a polycarbosilane having a main chain comprising a silicon atom and a carbon atom being alternately and successively bonded and a structural unit represented by a general formula (1), and a structural unit formed by replacing H in the formula (1) with CH3, OH or OR (R represents a monovalent hydrocarbon group), and at least one organic solvent selected from the group consisting of the compounds represented by a general formula (5). R1O(CHCH3CH2O)aR2... (5). COPYRIGHT: (C)2009,JPO&INPIT