POLYLYSINE FORMULATION AND COSMETIC COMPOSITION CONTAINING THE SAME

PROBLEM TO BE SOLVED: To provide new antiallergic agents and histamine isolation inhibitors, and a safe cosmetic composition containing at least one of them. SOLUTION: The antiallergic agents contain -polylysine. The histamine isolation inhibitors contain -polylysine. The safe cosmetic composition c...

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Bibliographische Detailangaben
Hauptverfasser: HATAKEYAMA MASAKAZU, HIRAKI JUN, SAWAI TOSHIYA, ARAKAWA KENJI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide new antiallergic agents and histamine isolation inhibitors, and a safe cosmetic composition containing at least one of them. SOLUTION: The antiallergic agents contain -polylysine. The histamine isolation inhibitors contain -polylysine. The safe cosmetic composition contains at least one of them. The -polylysine is allowed to use free -polylysine; an inorganic salt of -polylysine formed by -polylysine with such inorganic acids as hydrochloric acid, sulfuric acid and phosphoric acid; and an organic salt of -polylysine formed by -polylysine with such organic salts as acetic acid, propionic acid, fumaric acid, malic acid, citric acid, maleic acid, adipic acid, gluconic acid and lactic acid. The cosmetic composition improves eczema, pimples and skin roughness; gives gloss, firmness and moistness to the skin; and is safe for humans and animals. COPYRIGHT: (C)2009,JPO&INPIT