ELECTROSTATIC CHUCK APPARATUS

PROBLEM TO BE SOLVED: To provide an electrostatic chuck effectively maintaining balance among a uniform distribution of backside gas, vapor-phase heat transfer, and solid-state contact heat transfer, and having a surface embossment pattern. SOLUTION: This electrostatic chuck includes an inclined con...

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Hauptverfasser: SAMIR TUGRUL, GRIMARD DENNIS
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide an electrostatic chuck effectively maintaining balance among a uniform distribution of backside gas, vapor-phase heat transfer, and solid-state contact heat transfer, and having a surface embossment pattern. SOLUTION: This electrostatic chuck includes an inclined conduit, or an inclined laser drilled passage, through which a heat transfer gas is supplied. A segment of the inclined conduit and/or the inclined laser drilled passage extends along an axis different from an axis of an electric field generated to hold a substrate to the chuck, thereby minimizing plasma arcing and backside gas ionization. A first plug may be inserted into the conduit, wherein a segment of a first exterior channel thereof extends along an axis different from the axis of the electric field. First and second plugs may be inserted into a ceramic sleeve which extends through at least one of a dielectric member and an electrode. Finally, the surface of the dielectric member may comprise embossments arranged at radial distances from the center of the dielectric member to improve heat transfer and gas distribution. COPYRIGHT: (C)2009,JPO&INPIT