PATTERN FORMING METHOD

PROBLEM TO BE SOLVED: To provide a pattern forming method capable of performing a good patterning which utilizes EUV light. SOLUTION: The pattern forming method includes the steps of: forming a first film on a substrate to be treated; forming a second film consisting of a silicon film on the first f...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	MITSUYOSHI YASURO, SHIOBARA HIDESHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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