METHOD OF MANUFACTURING SEMICONDUCTOR APPARATUS

PROBLEM TO BE SOLVED: To form a line-and-space pattern having a fine pitch smaller than the resolution limit of exposure technology. SOLUTION: A method of manufacturing a semiconductor apparatus includes: laminating a first film 16 on a film to be processed 15 laminated on a semiconductor substrate...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	NARITA MASAKI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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