COATING/DEVELOPING APPARATUS, COATING/DEVELOPING METHOD, AND STORAGE MEDIUM

PROBLEM TO BE SOLVED: To coat a substrate with a resist and subject it to developing processing to prevent residues from being deposited and remaining as a defect on the surface of the resist of the substrate. SOLUTION: A coating/developing apparatus includes: a coating module for coating the surfac...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	KYODA HIDEJI, MOTOTAKE KOICHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPARATUS SPECIALLY ADAPTED THEREFOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To coat a substrate with a resist and subject it to developing processing to prevent residues from being deposited and remaining as a defect on the surface of the resist of the substrate. SOLUTION: A coating/developing apparatus includes: a coating module for coating the surface of a substrate with a resist; a developing module for supplying a developing solution onto the surface of the substrate after coated with the resist and then light exposed to form a pattern on the resist; and a chemical solution nozzle for supplying a chemical to the substrate to enhance the hydrophilic property of the surface of the resist without modifying the resist and to remove a residue deposited on the resist after developed. As the chemical, an alcohol or an alcohol containing an acid is used. COPYRIGHT: (C)2009,JPO&INPIT