APPLYING/DEVELOPING APPARATUS AND METHOD AND STORAGE MEDIUM

PROBLEM TO BE SOLVED: To produce resist patterns of preferred shapes by applying a chemically amplified resist to a substrate, performing immersion exposure on the substrate, and developing thereof. SOLUTION: The applying/developing apparatus comprises: an applying module to apply a chemically amplified resist to the surface of a substrate and form a resist membrane on it; a gas processing module equipped with a gas discharge portion to discharge process gas to supply acid to the substrate after the resist membrane is exposed by liquid immersion exposure and an exhaust portion to remove surplus process gas which was applied to the substrate; a heating module to heat the gas-supplied substrate to cause a catalysis by an acid generated in the resist and change the solubility to the developing solution in the exposed region; and a developing module to develop the substrate heated by the heating module and form a pattern on the resist membrane. An acid is added to a liquid left on the substrate. COPYRIGHT: (C)2009,JPO&INPIT