MASKLESS EXPOSURE APPARATUS

PROBLEM TO BE SOLVED: To provide a maskless exposure apparatus capable of improving operation efficiency without raising the price of the apparatus too much. SOLUTION: The maskless exposure apparatus has a structure in which a rectangular DMD 3 having a plurality of mirrors M arranged in a column di...

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Bibliographische Detailangaben
1. Verfasser:	OSAKA YOSHIHISA
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a maskless exposure apparatus capable of improving operation efficiency without raising the price of the apparatus too much. SOLUTION: The maskless exposure apparatus has a structure in which a rectangular DMD 3 having a plurality of mirrors M arranged in a column direction and a row direction is irradiated with light, the DMD 3 and a workpiece 6 are relatively moved in the column direction, the mirrors M are individually turned on/off and the lights reflected on the mirrors M are made incident on the surface of the workpiece 6, thereby forming a desired pattern on the workpiece 6. The maskless exposure apparatus is provided with two deflection means 11A, 11B so that the group of reflection lights of the mirrors M can be divided into two groups, and the deflection means 11A, 11B are disposed between the DMD 3 and the workpiece 6 so that the reflection light group divided into two are aligned in the column direction. COPYRIGHT: (C)2009,JPO&INPIT