METHOD OF MANUFACTURING PHOTOMASK

PROBLEM TO BE SOLVED: To provide a technique for quantitatively expressing a manufacturing difficulty level of a photomask and for efficiently manufacturing the photomask. SOLUTION: A mask manufacturing difficulty level different in each mask layout, product and mask layer is relatively grasped with...

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Hauptverfasser:	NAGAMURA YOSHIKAZU, NARUKAWA TERUSATO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CALCULATING CINEMATOGRAPHY COMPUTING COUNTING DATA PROCESSING SYSTEMS OR METHODS, SPECIALLY ADAPTED FORADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL, SUPERVISORYOR FORECASTING PURPOSES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE,COMMERCIAL, FINANCIAL, MANAGERIAL, SUPERVISORY OR FORECASTINGPURPOSES, NOT OTHERWISE PROVIDED FOR
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a technique for quantitatively expressing a manufacturing difficulty level of a photomask and for efficiently manufacturing the photomask. SOLUTION: A mask manufacturing difficulty level different in each mask layout, product and mask layer is relatively grasped with a mask manufacturing load index calculated by a mask manufacturing load prediction system, and in a stage where layout correction is possible, the final layout is corrected to a layout with a low difficulty level, and a mask ordering party provides a mask manufacturer with information regarding the mask manufacturing difficulty level at early timing. The mask manufacturing load index is expressed with a defect guarantee load index and a lithography load index. COPYRIGHT: (C)2009,JPO&INPIT