LIQUEFIED GAS FILLING SYSTEM

PROBLEM TO BE SOLVED: To correct a vapor movement amount caused by movement of vapor of a filled vessel to a liquefied gas storage layer when filling the liquefied gas in the liquified gas storage layer into the filled vessel. SOLUTION: A control circuit 90 calculates a vapor movement amount Q4 base...

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1. Verfasser: AMEMORI HIROYUKI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To correct a vapor movement amount caused by movement of vapor of a filled vessel to a liquefied gas storage layer when filling the liquefied gas in the liquified gas storage layer into the filled vessel. SOLUTION: A control circuit 90 calculates a vapor movement amount Q4 based on pressures P12 and P22 measured by first and second pressure detectors 120 and 130 and a temperature T measured by a temperature detector 140 after opening a second on-off valve V4 by starting of filling. Next, a pump 70 is stopped, and a first on-off valve V1 is closed, and then, a liquid integration flow rate Q1 integrating a flow rate pulse measured by a flow meter 64 is read. A total vapor movement amount Q4 obtained by relationship between the temperature T detected by the temperature detector 140 and the pressures P11 and P21 and the pressures P12 and P23 measured by the first and the second pressure detectors 120 and 130 is subtracted from the liquid integration flow rate Q1, and a liquid filling amount Q0 actually filled is calculated. COPYRIGHT: (C)2009,JPO&INPIT