PHOTOMASK AND PATTERN FORMATION METHOD USING THE SAME

PROBLEM TO BE SOLVED: To simultaneously form a fine line pattern and a thick line pattern using an enhancer mask capable of performing simultaneous formation of a fine isolated line pattern and a dense line pattern. SOLUTION: The photomask includes a first light-shielding pattern 6 having a first di...

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Bibliographische Detailangaben

Hauptverfasser:	SASAKO MASARU, SHIMIZU TADAYOSHI, MITSUSAKA AKIO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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