THIN VANADIUM OXIDE FILM PATTERN AND ITS PRODUCING METHOD

PROBLEM TO BE SOLVED: To provide a thin vanadium oxide film pattern, its producing method and its member. SOLUTION: The thin vanadium oxide film pattern produced in such a way that an APTS-SAM and the like are produced on the surface of a substrate by using APTS (3-Aminopropyltriethoxysilane, H2NC3H...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	MASUDA YOSHITAKE, KAWAMOTO KUNIHITO
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSESC01D OR C01F DIFFUSION TREATMENT OF METALLIC MATERIAL GLASS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INORGANIC CHEMISTRY JOINING GLASS TO GLASS OR OTHER MATERIALS METALLURGY MINERAL OR SLAG WOOL SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a thin vanadium oxide film pattern, its producing method and its member. SOLUTION: The thin vanadium oxide film pattern produced in such a way that an APTS-SAM and the like are produced on the surface of a substrate by using APTS (3-Aminopropyltriethoxysilane, H2NC3H5Si(OCH3)3) and the like, ultraviolet light is irradiated in vacuum to the APTS-SAM through a photomask to modify an exposing region from an amino group-ended silane to a silanol group and then a vanadium oxide is deposited in a liquid phase with a patterned self-assembled monomolecular film having the surfaces of the amino group-ended silane and the silanol group as a template to perform the patterning of the vanadium oxide, its producing method and a vanadium oxide-based device are provided. COPYRIGHT: (C)2009,JPO&INPIT