MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND SOLID-STATE IMAGING DEVICE

PROBLEM TO BE SOLVED: To provide a manufacturing method of a semiconductor device in which an impurity region is formed narrowly and deeply, and provide a solid-state imaging device. SOLUTION: The manufacturing method of the semiconductor device includes a process for forming a first hard mask 6 hav...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	MIYOSHI YASUSHI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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