EXPOSURE APPARATUS AND METHOD OF EXPOSING SEMICONDUCTOR SUBSTRATE

PROBLEM TO BE SOLVED: To provide an exposure apparatus which can correct the critical dimension nonuniformity of a photoresist pattern on a semiconductor substrate and can be used versatilely for various phototmasks, and to provide a method of exposing a semiconductor substrate. SOLUTION: An exposur...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	KIM BYUNG-GOOK, NAM DONG-SEOK, SAI SEIUN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an exposure apparatus which can correct the critical dimension nonuniformity of a photoresist pattern on a semiconductor substrate and can be used versatilely for various phototmasks, and to provide a method of exposing a semiconductor substrate. SOLUTION: An exposure apparatus includes a light source to emit light, a photomask in a path of the light between the light source and the semiconductor substrate and having patterns to be transcribed onto the semiconductor substrate, and a spatial light modulator (SLM) arranged in one of an image correction region of the photomask between the light source and the photomask and adapted to adjust a distribution of intensity of the light. COPYRIGHT: (C)2009,JPO&INPIT