ROTATION MECHANISM AND ELECTRON BEAM LITHOGRAPHY DEVICE

PROBLEM TO BE SOLVED: To precisely align a substrate on the center of rotation of a rotation table. SOLUTION: A substrate tray 40 is placed on the rotation table 32 while fixation lock pins 50A and 50C and a movement lock pin 50B provided on the rotation table 32 are inserted into circular openings...

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Bibliographische Detailangaben
1. Verfasser:	MURAYAMA NOBORU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To precisely align a substrate on the center of rotation of a rotation table. SOLUTION: A substrate tray 40 is placed on the rotation table 32 while fixation lock pins 50A and 50C and a movement lock pin 50B provided on the rotation table 32 are inserted into circular openings 41a to 41c formed in the substrate tray 40. Thereafter, by moving the movement lock pin 50B of the rotation table 32 radially away from the center of the rotation table 32, a center of a circle C1 having the inscribed circular openings 41a to 41c of the substrate tray 40, is positioned at the center of rotation of the rotation table 32. As a result, the center of the substrate W can be precisely positioned at the center of rotation. COPYRIGHT: (C)2009,JPO&INPIT