MOLD FOR NANOIMPRINT AND ITS MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a mold matrix material which is excellent in oil repellency and is used for a nanoimprint, and to provide its manufacturing method. SOLUTION: The mold matrix material and the mold used for the nanoimprint have a mold surface composed of fluorinated composite quartz g...

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Bibliographische Detailangaben
Hauptverfasser:	OKADA KANAME, TAMITSUJI SHINYA, WATANABE KUNIO
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS SEMICONDUCTOR DEVICES SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a mold matrix material which is excellent in oil repellency and is used for a nanoimprint, and to provide its manufacturing method. SOLUTION: The mold matrix material and the mold used for the nanoimprint have a mold surface composed of fluorinated composite quartz glass which is characterized by the fluorine atom density of ≥1,000 ppm on the surface, and have excellent oil repellency. In the method for manufacturing the mold matrix material or the mold, the mold surface of the mold, which is composed of synthetic quartz glass and is used for nanoimprint, is fluorinated. COPYRIGHT: (C)2009,JPO&INPIT