EQUIPMENT FOR MANUFACTURING POLYCRYSTAL SILICON

EQUIPMENT FOR MANUFACTURING POLYCRYSTAL SILICON

PROBLEM TO BE SOLVED: To provide equipment for manufacturing polycrystal silicon, wherein an quake-absorbing structure is applied at a low cost so that a function is surely kept even in the case of earthquakes in low to medium scales which frequently occur. SOLUTION: The equipment for manufacturing...

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Hauptverfasser: KAMEI ISAO, NAKAMURA TAKESHI, KUBOTA JUNICHI, YOKOYAMA NORIYUKI, HASHIMOTO NORIYUKI
Format: Patent
Sprache:eng
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CHEMISTRY
COMPOUNDS THEREOF
INORGANIC CHEMISTRY
METALLURGY
NON-METALLIC ELEMENTS
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creator KAMEI ISAO
NAKAMURA TAKESHI
KUBOTA JUNICHI
YOKOYAMA NORIYUKI
HASHIMOTO NORIYUKI
description PROBLEM TO BE SOLVED: To provide equipment for manufacturing polycrystal silicon, wherein an quake-absorbing structure is applied at a low cost so that a function is surely kept even in the case of earthquakes in low to medium scales which frequently occur. SOLUTION: The equipment for manufacturing polycrystal silicon, wherein reaction chambers 2 for precipitating and growing silicon by a chemical vapor phase precipitation method on a silicon core material 3 standing on an electrode so as to obtain polycrystal silicon rods 3, are arranged in a factory building, is characterized in that a quake-absorbing structure is applied to the polycrystal silicon rods in the reaction chambers 2. COPYRIGHT: (C)2009,JPO&INPIT
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2009040643A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2009040643A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2009040643A3</originalsourceid><addsrcrecordid>eNrjZNB3DQz1DPB19QtRcPMPUvB19At1c3QOCQ3y9HNXCPD3iXQOigwOcfRRCPb08XT29-NhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFeAUYGBpYGJgZmJsaOxkQpAgCKvCbs</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>EQUIPMENT FOR MANUFACTURING POLYCRYSTAL SILICON</title><source>esp@cenet</source><creator>KAMEI ISAO ; NAKAMURA TAKESHI ; KUBOTA JUNICHI ; YOKOYAMA NORIYUKI ; HASHIMOTO NORIYUKI</creator><creatorcontrib>KAMEI ISAO ; NAKAMURA TAKESHI ; KUBOTA JUNICHI ; YOKOYAMA NORIYUKI ; HASHIMOTO NORIYUKI</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide equipment for manufacturing polycrystal silicon, wherein an quake-absorbing structure is applied at a low cost so that a function is surely kept even in the case of earthquakes in low to medium scales which frequently occur. SOLUTION: The equipment for manufacturing polycrystal silicon, wherein reaction chambers 2 for precipitating and growing silicon by a chemical vapor phase precipitation method on a silicon core material 3 standing on an electrode so as to obtain polycrystal silicon rods 3, are arranged in a factory building, is characterized in that a quake-absorbing structure is applied to the polycrystal silicon rods in the reaction chambers 2. COPYRIGHT: (C)2009,JPO&amp;INPIT</description><language>eng</language><subject>CHEMISTRY ; COMPOUNDS THEREOF ; INORGANIC CHEMISTRY ; METALLURGY ; NON-METALLIC ELEMENTS</subject><creationdate>2009</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20090226&amp;DB=EPODOC&amp;CC=JP&amp;NR=2009040643A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20090226&amp;DB=EPODOC&amp;CC=JP&amp;NR=2009040643A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KAMEI ISAO</creatorcontrib><creatorcontrib>NAKAMURA TAKESHI</creatorcontrib><creatorcontrib>KUBOTA JUNICHI</creatorcontrib><creatorcontrib>YOKOYAMA NORIYUKI</creatorcontrib><creatorcontrib>HASHIMOTO NORIYUKI</creatorcontrib><title>EQUIPMENT FOR MANUFACTURING POLYCRYSTAL SILICON</title><description>PROBLEM TO BE SOLVED: To provide equipment for manufacturing polycrystal silicon, wherein an quake-absorbing structure is applied at a low cost so that a function is surely kept even in the case of earthquakes in low to medium scales which frequently occur. SOLUTION: The equipment for manufacturing polycrystal silicon, wherein reaction chambers 2 for precipitating and growing silicon by a chemical vapor phase precipitation method on a silicon core material 3 standing on an electrode so as to obtain polycrystal silicon rods 3, are arranged in a factory building, is characterized in that a quake-absorbing structure is applied to the polycrystal silicon rods in the reaction chambers 2. COPYRIGHT: (C)2009,JPO&amp;INPIT</description><subject>CHEMISTRY</subject><subject>COMPOUNDS THEREOF</subject><subject>INORGANIC CHEMISTRY</subject><subject>METALLURGY</subject><subject>NON-METALLIC ELEMENTS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2009</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNB3DQz1DPB19QtRcPMPUvB19At1c3QOCQ3y9HNXCPD3iXQOigwOcfRRCPb08XT29-NhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFeAUYGBpYGJgZmJsaOxkQpAgCKvCbs</recordid><startdate>20090226</startdate><enddate>20090226</enddate><creator>KAMEI ISAO</creator><creator>NAKAMURA TAKESHI</creator><creator>KUBOTA JUNICHI</creator><creator>YOKOYAMA NORIYUKI</creator><creator>HASHIMOTO NORIYUKI</creator><scope>EVB</scope></search><sort><creationdate>20090226</creationdate><title>EQUIPMENT FOR MANUFACTURING POLYCRYSTAL SILICON</title><author>KAMEI ISAO ; NAKAMURA TAKESHI ; KUBOTA JUNICHI ; YOKOYAMA NORIYUKI ; HASHIMOTO NORIYUKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2009040643A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2009</creationdate><topic>CHEMISTRY</topic><topic>COMPOUNDS THEREOF</topic><topic>INORGANIC CHEMISTRY</topic><topic>METALLURGY</topic><topic>NON-METALLIC ELEMENTS</topic><toplevel>online_resources</toplevel><creatorcontrib>KAMEI ISAO</creatorcontrib><creatorcontrib>NAKAMURA TAKESHI</creatorcontrib><creatorcontrib>KUBOTA JUNICHI</creatorcontrib><creatorcontrib>YOKOYAMA NORIYUKI</creatorcontrib><creatorcontrib>HASHIMOTO NORIYUKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KAMEI ISAO</au><au>NAKAMURA TAKESHI</au><au>KUBOTA JUNICHI</au><au>YOKOYAMA NORIYUKI</au><au>HASHIMOTO NORIYUKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>EQUIPMENT FOR MANUFACTURING POLYCRYSTAL SILICON</title><date>2009-02-26</date><risdate>2009</risdate><abstract>PROBLEM TO BE SOLVED: To provide equipment for manufacturing polycrystal silicon, wherein an quake-absorbing structure is applied at a low cost so that a function is surely kept even in the case of earthquakes in low to medium scales which frequently occur. SOLUTION: The equipment for manufacturing polycrystal silicon, wherein reaction chambers 2 for precipitating and growing silicon by a chemical vapor phase precipitation method on a silicon core material 3 standing on an electrode so as to obtain polycrystal silicon rods 3, are arranged in a factory building, is characterized in that a quake-absorbing structure is applied to the polycrystal silicon rods in the reaction chambers 2. COPYRIGHT: (C)2009,JPO&amp;INPIT</abstract><oa>free_for_read</oa></addata></record>
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subjects CHEMISTRY
COMPOUNDS THEREOF
INORGANIC CHEMISTRY
METALLURGY
NON-METALLIC ELEMENTS
title EQUIPMENT FOR MANUFACTURING POLYCRYSTAL SILICON
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-19T17%3A01%3A48IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=KAMEI%20ISAO&rft.date=2009-02-26&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2009040643A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true