IMAGING APPARATUS FOR EUV LIGHT OR X-RAY, AND EUV EXPOSURE APPARATUS

PROBLEM TO BE SOLVED: To prevent the smear occurring in an image without having an electronic shutter and a mechanical shutter. SOLUTION: This imaging apparatus for EUV light or X-rays includes an imaging section for forming an image by imaging using EUV light or X-rays, and an acquiring section for...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
1. Verfasser:	OKINO TERUAKI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To prevent the smear occurring in an image without having an electronic shutter and a mechanical shutter. SOLUTION: This imaging apparatus for EUV light or X-rays includes an imaging section for forming an image by imaging using EUV light or X-rays, and an acquiring section for acquiring the differential image between the first image formed by carrying out imaging with a first exposure time by the imaging section and the second image formed by carrying out imaging with a second exposure time by the imaging section. Further, an EUV exposure apparatus of this invention includes the imaging apparatus for EUV light. COPYRIGHT: (C)2009,JPO&INPIT