EXPOSURE APPARATUS, EXPOSURE METHOD AND METHOD FOR MANUFACTURING PANEL SUBSTRATE FOR DISPLAY

PROBLEM TO BE SOLVED: To position a substrate during exposure with high accuracy by using a laser length measuring system in proximity exposure using a plurality of moving stages. SOLUTION: Each moving stage mounts chucks 10a, 10b and moves over sub-stage bases 11a, 11b and a main stage base 11 to p...

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Bibliographische Detailangaben

Hauptverfasser:	HAYASHI TOMOAKI, SATO RIYUUGO, MATSUYAMA KATSUAKI, NEMOTO RYOJI, MORI JUNICHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING
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