EXPOSURE APPARATUS, EXPOSURE METHOD AND METHOD FOR MANUFACTURING PANEL SUBSTRATE FOR DISPLAY

PROBLEM TO BE SOLVED: To position a substrate during exposure with high accuracy by using a laser length measuring system in proximity exposure using a plurality of moving stages. SOLUTION: Each moving stage mounts chucks 10a, 10b and moves over sub-stage bases 11a, 11b and a main stage base 11 to position a substrate 1 on the main stage base 11. Each first laser length measuring system includes laser light sources 31a, 31b, bar mirrors 34a, 34b mounted under an X-stage 14 of each moving stage, and laser interferometers 32a, 32b placed at a position out of an X guide 13 of the main stage base 11, and detects a position in the X direction of each moving stage. The laser interferometers 32a, 32b are not influenced by vibration of the sub-stage bases 11a, 11b, and a measurement distance from the laser interferometers 32a, 32b to each moving stage on the main stage base 11 is reduced. COPYRIGHT: (C)2009,JPO&INPIT