PHOTOSENSITIVE COMPOSITION

PROBLEM TO BE SOLVED: To provide a highly-sensitive and water-developable photosensitive composition particularly suitable for a planographic printing plate, directly mounted to a printing machine, and implementing a print process without a developing apparatus, and without for implementing a develo...

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Bibliographische Detailangaben
Hauptverfasser:	FURUKAWA AKIRA, DOI KUNIHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY LINING MACHINES MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING,INKING, DAMPING, OR THE LIKE MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM PRINTING PRINTING PLATES OR FOILS STAMPS TRANSPORTING TYPEWRITERS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a highly-sensitive and water-developable photosensitive composition particularly suitable for a planographic printing plate, directly mounted to a printing machine, and implementing a print process without a developing apparatus, and without for implementing a developing process, and also to provide a printing method thereof. SOLUTION: The photosensitive composition contains a cationic monomer having two or more polymerizable unsaturated bond groups within a molecule, a polymer, and a photo polymerization initiator or a photoacid generation agent. COPYRIGHT: (C)2009,JPO&INPIT