STRUCTURAL COMPONENT OF EXPOSURE APPARATUS, EXPOSURE APPARATUS, EXPOSURE METHOD, METHOD FOR MANUFACTURING DEVICE, AND DEVICE

PROBLEM TO BE SOLVED: To form a pattern on a plate with high accuracy. SOLUTION: A plurality of core groups (a core group consisting of cores CR1,1, CR1,2, CR1,3,...CR1,M, a core group consisting of cores CR2,1, CR2,2, CR2,3,...CR2,M, and so on) spaced with a prescribed interval along a Y-axis direc...

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Bibliographische Detailangaben
1. Verfasser: YAMATO SOICHI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To form a pattern on a plate with high accuracy. SOLUTION: A plurality of core groups (a core group consisting of cores CR1,1, CR1,2, CR1,3,...CR1,M, a core group consisting of cores CR2,1, CR2,2, CR2,3,...CR2,M, and so on) spaced with a prescribed interval along a Y-axis direction are placed in different positions from one another with respect to an X-axis direction. One core in the plurality of core lines is placed in a position different from other cores with respect to the Y-axis direction. Thereby, the plurality of cores are present without overlapping one another with respect to the Y-axis direction, so that a pattern is formed (by exposure) with high accuracy on a plate by scanning the plate while allowing the illumination light to exit or not to exit from each core. COPYRIGHT: (C)2009,JPO&INPIT