LITHOGRAPHY DEVICE WITH PORTION WHERETO COATED FILM IS ATTACHED

PROBLEM TO BE SOLVED: To provide a lithography device which is properly protected against negative effect from ultraviolet radiation and/or immersion liquid, for example. SOLUTION: A lithography device having a detachable sticky film with coating on at least part thereof is disclosed. A liquid suppl...

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Bibliographische Detailangaben
Hauptverfasser:	LIEBREGTS PAULUS MARTINUS MARIA, STEFFENS KOEN, LOOPSTRA ERIK R, BRANDS GERT-JAN GERARDUS JOHANEES THOMAS, JANSSEN FRANCISCUS JOHANNES JOSEPH, FIEN MENNO, SIMONS WILHELMUS FRANCISCUS JOHANNES, DIREKS DANIEL JOSEPH MARIA, VAN DER HAM RONALD
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a lithography device which is properly protected against negative effect from ultraviolet radiation and/or immersion liquid, for example. SOLUTION: A lithography device having a detachable sticky film with coating on at least part thereof is disclosed. A liquid supply system with a liquid confinement structure extended along at least part of a boundary of a space between a projection system and a substrate support is disclosed. A film with coating exists on at least part of the liquid confinement structure. COPYRIGHT: (C)2009,JPO&INPIT