BLACK PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING BLACK MATRIX USING THE SAME AND COLOR FILTER, AND LIQUID CRYSTAL DISPLAY

PROBLEM TO BE SOLVED: To provide a black photosensitive resin composition for obtaining a black matrix excellent in pattern reproducibility, a method for producing a black matrix using the same and a color filter, and a liquid crystal display. SOLUTION: The black photosensitive resin composition com...

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Hauptverfasser:	MINATO KOICHI, KADOTA SOHEI, DEMACHI YASUYUKI, SHIMIZU MIE
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTROGRAPHY FREQUENCY-CHANGING HOLOGRAPHY MATERIALS THEREFOR NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICAL LOGIC ELEMENTS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a black photosensitive resin composition for obtaining a black matrix excellent in pattern reproducibility, a method for producing a black matrix using the same and a color filter, and a liquid crystal display. SOLUTION: The black photosensitive resin composition comprises at least a photopolymerizable monomer, a resin binder, a polymerization initiator, a black pigment and a solvent, wherein the polymerization initiator comprises at least one selected from an acetophenone-based photopolymerization initiator, a sulfonium organoboron complex and an oxosulfonium organoboron complex. The black photosensitive resin composition is applied on a transparent substrate 11 to form a black photosensitive layer 21, and this layer is subjected to pattern exposure with far-ultraviolet radiation of 254 nm exposure wavelength and to patterning processing such as development to obtain a black matrix 21a excellent in pattern reproducibility. COPYRIGHT: (C)2009,JPO&INPIT