COATING LIQUID SUPPLY SYSTEM

PROBLEM TO BE SOLVED: To provide a coating supply system which is capable of applying a large amount of a coating liquid with a constant temperature at a breath. SOLUTION: A pump 8 of a second circulation pathway 3 is always driven to keep the temperature of a development solution in a tank 1 consta...

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Bibliographische Detailangaben
1. Verfasser:	SHIMAI FUTOSHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPARATUS SPECIALLY ADAPTED THEREFOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a coating supply system which is capable of applying a large amount of a coating liquid with a constant temperature at a breath. SOLUTION: A pump 8 of a second circulation pathway 3 is always driven to keep the temperature of a development solution in a tank 1 constant. In this state, a pump 4 of a first circulation pathway 2 is driven to send the development solution pumped out by the pump 4 to a slit nozzle 6. At this time, if an on-off valve 7 is closed, the development solution supplied into the slit nozzle 6 flows down from a slit like discharge port 6d to the lower part in a state like a curtain and is supplied to the surface of a substrate to be treated. COPYRIGHT: (C)2009,JPO&INPIT