FORMING METHOD OF RETARDATION FILM, LIQUID CRYSTAL DEVICE AND ITS MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a forming method of a retardation film having high heat resistance. SOLUTION: The forming method of the retardation film includes a process of applying an aligned film material onto one surface of a transparent substrate 10, a process of subjecting the aligned film m...

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1. Verfasser: SEKI TAKUMI
Format: Patent
Sprache:eng
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