FORMING METHOD OF RETARDATION FILM, LIQUID CRYSTAL DEVICE AND ITS MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a forming method of a retardation film having high heat resistance. SOLUTION: The forming method of the retardation film includes a process of applying an aligned film material onto one surface of a transparent substrate 10, a process of subjecting the aligned film m...

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Bibliographische Detailangaben
1. Verfasser:	SEKI TAKUMI
Format:	Patent
Sprache:	eng
Schlagworte:	DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING FREQUENCY-CHANGING NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a forming method of a retardation film having high heat resistance. SOLUTION: The forming method of the retardation film includes a process of applying an aligned film material onto one surface of a transparent substrate 10, a process of subjecting the aligned film material to heat treatment and alignment treatment to form a first aligned film 13, a process of applying a retardation film material onto the first aligned film 13 to form an anisotropic film 14, a process of forming a positive type photosensitive resin layer 16 on the anisotropic film 14, a process of obtaining the retardation film 25 by irradiating the anisotropic film 14 with exposure light 50 to cure the anisotropic film 14 and a process of removing the positive type photosensitive resin layer 16. COPYRIGHT: (C)2009,JPO&INPIT