FORMING METHOD OF RETARDATION FILM, LIQUID CRYSTAL DEVICE, AND ITS MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a forming method of a retardation film with which the retardation film having high heat resistance can be formed, to provide a liquid crystal device and to provide its manufacturing method. SOLUTION: The forming method of the retardation film includes a step for appl...

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1. Verfasser: SEKI TAKUMI
Format: Patent
Sprache:eng
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