FORMING METHOD OF RETARDATION FILM, LIQUID CRYSTAL DEVICE, AND ITS MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a forming method of a retardation film with which the retardation film having high heat resistance can be formed, to provide a liquid crystal device and to provide its manufacturing method. SOLUTION: The forming method of the retardation film includes a step for appl...

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Bibliographische Detailangaben
1. Verfasser:	SEKI TAKUMI
Format:	Patent
Sprache:	eng
Schlagworte:	DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING FREQUENCY-CHANGING NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a forming method of a retardation film with which the retardation film having high heat resistance can be formed, to provide a liquid crystal device and to provide its manufacturing method. SOLUTION: The forming method of the retardation film includes a step for applying an alignment layer material on a substrate 10, a step for forming a first alignment layer 13 by subjecting the alignment layer material to heat treatment and alignment treatment, a step for applying a liquid material containing a retardation film material on the first alignment layer 13 to form an isotropic film 14, a step for forming a negative photosensitive resin layer 16 on the anisotropic film 14 and a step for irradiating the anisotropic film 14 with exposure light 50 via the negative photosensitive resin layer 16 to simultaneously cure the negative photosensitive resin layer 16 and the anisotropic film 14. COPYRIGHT: (C)2009,JPO&INPIT