COATED FILM AND VAPOR DEPOSITION FILM

PROBLEM TO BE SOLVED: To provide a vapor deposition film which is excellent in gas barrier properties against oxygen and water vapor and having the feature that the gas barrier property does not deteriorate even when the film is bent, and to provide a coated film used as the base material of the vap...

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Bibliographische Detailangaben
Hauptverfasser: NOSE KATSUHIKO, KUWABARA MITSURU
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a vapor deposition film which is excellent in gas barrier properties against oxygen and water vapor and having the feature that the gas barrier property does not deteriorate even when the film is bent, and to provide a coated film used as the base material of the vapor deposition film and showing high gas barrier properties. SOLUTION: The coated film is prepared by overlaying a substrate consisting of a polymer resin composition with a coating layer that comprises a melamine compound, a polyvinyl alcohol polymer and a compound having a carboxyl group, characterized in that the thickness of the coated film is 5-50 μm, and the mass of formaldehyde and the mass of an alcohol generated from the coated film, when it is heated at 130°C, are each ≤50 ppm of the mass of the coated film sample. The vapor deposition film is prepared by depositing an inorganic thin layer on the coating layer of the above film. COPYRIGHT: (C)2009,JPO&INPIT