MANUFACTURING METHOD OF THIN FILM MAGNETIC HEAD AND PHOTOMASK FOR FORMING MAGNETIC POLE

PROBLEM TO BE SOLVED: To provide a manufacturing method of a thin film magnetic head and a photomask for forming a magnetic pole which improve the shape precision of a magnetic pole layer. SOLUTION: At the photomask for forming a resist pattern for forming the magnetic pole, there formed are a first exposure area for demarcating a forming area of a magnetic pole part, a second exposure area for demarcating the forming area of a flare part, and a correction pattern which is connected with a light-shielding area at the boundary position of the first exposure area and the second exposure area and demarcates a third exposure area having the same width as the magnetic pole part along an outer periphery edge in the second exposure area. Next, using the photomask, the resist for forming a pattern is exposed while the first and third exposure areas are made into an optimally focused state. Thereafter, it is developed to obtain the resist pattern. Then, the magnetic pole layer is formed in a magnetic pole formation area demarcated by the resist pattern. COPYRIGHT: (C)2009,JPO&INPIT