LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD
PROBLEM TO BE SOLVED: To provide a lithographic apparatus in which liquid can be drained through a gap between, for example, an edge of an object and a substrate table on which the object is set. SOLUTION: The liquid immersion lithographic apparatus has a drain formed for draining the liquid through...
Gespeichert in:
| Hauptverfasser: | , , , , , , , , , , , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | LEVASIER LEON MARTIN WANTEN PETER FRANCISCUS JACOBS JOHANNES HENRICUS WILHELMUS ZAAL KOEN JACOBUS J M VAN DER HOEVEN JAN CORNELIS VAN DER MEULEN FRITS DE JONG FREDERIK E DE KLERK JOHANNES W DE JONG MARTEIJN ANSTOTZ DAVID LUCIEN ANTONIUS LEENDERS MARTINUS HENDRIKUS OTTENS JOOST JEROEN BEEMS MARCEL HENDRIKUS MARIA JOHANNES DROSTE RICHARD BERNARDUS VAN DEN BRINK MARINUS AART KADIJK EDWIN CORNELIS |
| description | PROBLEM TO BE SOLVED: To provide a lithographic apparatus in which liquid can be drained through a gap between, for example, an edge of an object and a substrate table on which the object is set. SOLUTION: The liquid immersion lithographic apparatus has a drain formed for draining the liquid through the gap between an edge of a substrate and the substrate table on which the substrate is supported. The drain is provided with a means which feeds the liquid to the drain irrespective of a position of the substrate table and/or a means which saturates gas in the drain. These means reduce fluctuation in heat loss due to evaporation of the liquid in the drain. COPYRIGHT: (C)2009,JPO&INPIT |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2008300829A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2008300829A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2008300829A3</originalsourceid><addsrcrecordid>eNrjZDD38Qzx8HcPcgzw8HRWcAwIcAxyDAkN1lFw9HNRcHEN83R2VfB19At1c3QOCQ3y9HNX8HUFanDhYWBNS8wpTuWF0twMSm6uIc4euqkF-fGpxQWJyal5qSXxXgFGBgYWxkBsZOloTJQiAI0KKKU</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD</title><source>esp@cenet</source><creator>LEVASIER LEON MARTIN ; WANTEN PETER FRANCISCUS ; JACOBS JOHANNES HENRICUS WILHELMUS ; ZAAL KOEN JACOBUS J M ; VAN DER HOEVEN JAN CORNELIS ; VAN DER MEULEN FRITS ; DE JONG FREDERIK E ; DE KLERK JOHANNES W ; DE JONG MARTEIJN ; ANSTOTZ DAVID LUCIEN ; ANTONIUS LEENDERS MARTINUS HENDRIKUS ; OTTENS JOOST JEROEN ; BEEMS MARCEL HENDRIKUS MARIA ; JOHANNES DROSTE RICHARD BERNARDUS ; VAN DEN BRINK MARINUS AART ; KADIJK EDWIN CORNELIS</creator><creatorcontrib>LEVASIER LEON MARTIN ; WANTEN PETER FRANCISCUS ; JACOBS JOHANNES HENRICUS WILHELMUS ; ZAAL KOEN JACOBUS J M ; VAN DER HOEVEN JAN CORNELIS ; VAN DER MEULEN FRITS ; DE JONG FREDERIK E ; DE KLERK JOHANNES W ; DE JONG MARTEIJN ; ANSTOTZ DAVID LUCIEN ; ANTONIUS LEENDERS MARTINUS HENDRIKUS ; OTTENS JOOST JEROEN ; BEEMS MARCEL HENDRIKUS MARIA ; JOHANNES DROSTE RICHARD BERNARDUS ; VAN DEN BRINK MARINUS AART ; KADIJK EDWIN CORNELIS</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide a lithographic apparatus in which liquid can be drained through a gap between, for example, an edge of an object and a substrate table on which the object is set. SOLUTION: The liquid immersion lithographic apparatus has a drain formed for draining the liquid through the gap between an edge of a substrate and the substrate table on which the substrate is supported. The drain is provided with a means which feeds the liquid to the drain irrespective of a position of the substrate table and/or a means which saturates gas in the drain. These means reduce fluctuation in heat loss due to evaporation of the liquid in the drain. COPYRIGHT: (C)2009,JPO&INPIT</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2008</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20081211&DB=EPODOC&CC=JP&NR=2008300829A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20081211&DB=EPODOC&CC=JP&NR=2008300829A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LEVASIER LEON MARTIN</creatorcontrib><creatorcontrib>WANTEN PETER FRANCISCUS</creatorcontrib><creatorcontrib>JACOBS JOHANNES HENRICUS WILHELMUS</creatorcontrib><creatorcontrib>ZAAL KOEN JACOBUS J M</creatorcontrib><creatorcontrib>VAN DER HOEVEN JAN CORNELIS</creatorcontrib><creatorcontrib>VAN DER MEULEN FRITS</creatorcontrib><creatorcontrib>DE JONG FREDERIK E</creatorcontrib><creatorcontrib>DE KLERK JOHANNES W</creatorcontrib><creatorcontrib>DE JONG MARTEIJN</creatorcontrib><creatorcontrib>ANSTOTZ DAVID LUCIEN</creatorcontrib><creatorcontrib>ANTONIUS LEENDERS MARTINUS HENDRIKUS</creatorcontrib><creatorcontrib>OTTENS JOOST JEROEN</creatorcontrib><creatorcontrib>BEEMS MARCEL HENDRIKUS MARIA</creatorcontrib><creatorcontrib>JOHANNES DROSTE RICHARD BERNARDUS</creatorcontrib><creatorcontrib>VAN DEN BRINK MARINUS AART</creatorcontrib><creatorcontrib>KADIJK EDWIN CORNELIS</creatorcontrib><title>LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD</title><description>PROBLEM TO BE SOLVED: To provide a lithographic apparatus in which liquid can be drained through a gap between, for example, an edge of an object and a substrate table on which the object is set. SOLUTION: The liquid immersion lithographic apparatus has a drain formed for draining the liquid through the gap between an edge of a substrate and the substrate table on which the substrate is supported. The drain is provided with a means which feeds the liquid to the drain irrespective of a position of the substrate table and/or a means which saturates gas in the drain. These means reduce fluctuation in heat loss due to evaporation of the liquid in the drain. COPYRIGHT: (C)2009,JPO&INPIT</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2008</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDD38Qzx8HcPcgzw8HRWcAwIcAxyDAkN1lFw9HNRcHEN83R2VfB19At1c3QOCQ3y9HNX8HUFanDhYWBNS8wpTuWF0twMSm6uIc4euqkF-fGpxQWJyal5qSXxXgFGBgYWxkBsZOloTJQiAI0KKKU</recordid><startdate>20081211</startdate><enddate>20081211</enddate><creator>LEVASIER LEON MARTIN</creator><creator>WANTEN PETER FRANCISCUS</creator><creator>JACOBS JOHANNES HENRICUS WILHELMUS</creator><creator>ZAAL KOEN JACOBUS J M</creator><creator>VAN DER HOEVEN JAN CORNELIS</creator><creator>VAN DER MEULEN FRITS</creator><creator>DE JONG FREDERIK E</creator><creator>DE KLERK JOHANNES W</creator><creator>DE JONG MARTEIJN</creator><creator>ANSTOTZ DAVID LUCIEN</creator><creator>ANTONIUS LEENDERS MARTINUS HENDRIKUS</creator><creator>OTTENS JOOST JEROEN</creator><creator>BEEMS MARCEL HENDRIKUS MARIA</creator><creator>JOHANNES DROSTE RICHARD BERNARDUS</creator><creator>VAN DEN BRINK MARINUS AART</creator><creator>KADIJK EDWIN CORNELIS</creator><scope>EVB</scope></search><sort><creationdate>20081211</creationdate><title>LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD</title><author>LEVASIER LEON MARTIN ; WANTEN PETER FRANCISCUS ; JACOBS JOHANNES HENRICUS WILHELMUS ; ZAAL KOEN JACOBUS J M ; VAN DER HOEVEN JAN CORNELIS ; VAN DER MEULEN FRITS ; DE JONG FREDERIK E ; DE KLERK JOHANNES W ; DE JONG MARTEIJN ; ANSTOTZ DAVID LUCIEN ; ANTONIUS LEENDERS MARTINUS HENDRIKUS ; OTTENS JOOST JEROEN ; BEEMS MARCEL HENDRIKUS MARIA ; JOHANNES DROSTE RICHARD BERNARDUS ; VAN DEN BRINK MARINUS AART ; KADIJK EDWIN CORNELIS</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2008300829A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2008</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>LEVASIER LEON MARTIN</creatorcontrib><creatorcontrib>WANTEN PETER FRANCISCUS</creatorcontrib><creatorcontrib>JACOBS JOHANNES HENRICUS WILHELMUS</creatorcontrib><creatorcontrib>ZAAL KOEN JACOBUS J M</creatorcontrib><creatorcontrib>VAN DER HOEVEN JAN CORNELIS</creatorcontrib><creatorcontrib>VAN DER MEULEN FRITS</creatorcontrib><creatorcontrib>DE JONG FREDERIK E</creatorcontrib><creatorcontrib>DE KLERK JOHANNES W</creatorcontrib><creatorcontrib>DE JONG MARTEIJN</creatorcontrib><creatorcontrib>ANSTOTZ DAVID LUCIEN</creatorcontrib><creatorcontrib>ANTONIUS LEENDERS MARTINUS HENDRIKUS</creatorcontrib><creatorcontrib>OTTENS JOOST JEROEN</creatorcontrib><creatorcontrib>BEEMS MARCEL HENDRIKUS MARIA</creatorcontrib><creatorcontrib>JOHANNES DROSTE RICHARD BERNARDUS</creatorcontrib><creatorcontrib>VAN DEN BRINK MARINUS AART</creatorcontrib><creatorcontrib>KADIJK EDWIN CORNELIS</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LEVASIER LEON MARTIN</au><au>WANTEN PETER FRANCISCUS</au><au>JACOBS JOHANNES HENRICUS WILHELMUS</au><au>ZAAL KOEN JACOBUS J M</au><au>VAN DER HOEVEN JAN CORNELIS</au><au>VAN DER MEULEN FRITS</au><au>DE JONG FREDERIK E</au><au>DE KLERK JOHANNES W</au><au>DE JONG MARTEIJN</au><au>ANSTOTZ DAVID LUCIEN</au><au>ANTONIUS LEENDERS MARTINUS HENDRIKUS</au><au>OTTENS JOOST JEROEN</au><au>BEEMS MARCEL HENDRIKUS MARIA</au><au>JOHANNES DROSTE RICHARD BERNARDUS</au><au>VAN DEN BRINK MARINUS AART</au><au>KADIJK EDWIN CORNELIS</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD</title><date>2008-12-11</date><risdate>2008</risdate><abstract>PROBLEM TO BE SOLVED: To provide a lithographic apparatus in which liquid can be drained through a gap between, for example, an edge of an object and a substrate table on which the object is set. SOLUTION: The liquid immersion lithographic apparatus has a drain formed for draining the liquid through the gap between an edge of a substrate and the substrate table on which the substrate is supported. The drain is provided with a means which feeds the liquid to the drain irrespective of a position of the substrate table and/or a means which saturates gas in the drain. These means reduce fluctuation in heat loss due to evaporation of the liquid in the drain. COPYRIGHT: (C)2009,JPO&INPIT</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_JP2008300829A |
| source | esp@cenet |
| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
| title | LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-02T01%3A47%3A56IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=LEVASIER%20LEON%20MARTIN&rft.date=2008-12-11&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2008300829A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |