LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a lithographic apparatus in which liquid can be drained through a gap between, for example, an edge of an object and a substrate table on which the object is set. SOLUTION: The liquid immersion lithographic apparatus has a drain formed for draining the liquid through...

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Bibliographische Detailangaben
Hauptverfasser:	LEVASIER LEON MARTIN, WANTEN PETER FRANCISCUS, JACOBS JOHANNES HENRICUS WILHELMUS, ZAAL KOEN JACOBUS J M, VAN DER HOEVEN JAN CORNELIS, VAN DER MEULEN FRITS, DE JONG FREDERIK E, DE KLERK JOHANNES W, DE JONG MARTEIJN, ANSTOTZ DAVID LUCIEN, ANTONIUS LEENDERS MARTINUS HENDRIKUS, OTTENS JOOST JEROEN, BEEMS MARCEL HENDRIKUS MARIA, JOHANNES DROSTE RICHARD BERNARDUS, VAN DEN BRINK MARINUS AART, KADIJK EDWIN CORNELIS
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a lithographic apparatus in which liquid can be drained through a gap between, for example, an edge of an object and a substrate table on which the object is set. SOLUTION: The liquid immersion lithographic apparatus has a drain formed for draining the liquid through the gap between an edge of a substrate and the substrate table on which the substrate is supported. The drain is provided with a means which feeds the liquid to the drain irrespective of a position of the substrate table and/or a means which saturates gas in the drain. These means reduce fluctuation in heat loss due to evaporation of the liquid in the drain. COPYRIGHT: (C)2009,JPO&INPIT