In2O3 THIN FILM PATTERN, In(OH)3 THIN FILM PATTERN AND METHODS FOR PRODUCING THEM

PROBLEM TO BE SOLVED: To provide: an InO3thin film pattern; an In(OH)3thin film pattern; and methods for producing them. SOLUTION: An In2O3material formed on a substrate is characterized in that it is selectively or non-selectively formed on an area adhered with Pd or noble metal nanoparticles, which area is provided on a self-assembled monomolecular film formed on the substrate and is In2O3crystal, the transmittance in a visible light region is >60%, the carrier concentration is at least 2.1×1019cm-3, the hole mobility is at least 5.2 cm2V-1s-1, and the specific resistance is lower than 5.8×10-2Ωcm. The method for producing the In2O3material and a transparent conductive electronic device are also provided. By the methods for producing the In2O3material or the like, the In2O3thin film pattern, the In(OH)3thin film pattern or the like can be synthesized not through an etching process. COPYRIGHT: (C)2009,JPO&INPIT