METHOD OF FORMING FINE PATTERN

PROBLEM TO BE SOLVED: To provide a method for the mass production of a chemical microdevice having high-accurate fine patterns using a common resin and a general-purpose forming machine. SOLUTION: The method of forming a resin structure having a fine pattern comprises using a mold having a spigot st...

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1. Verfasser:	UESUGI SHOJI
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULARARTICLES INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS PERFORMING OPERATIONS SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method for the mass production of a chemical microdevice having high-accurate fine patterns using a common resin and a general-purpose forming machine. SOLUTION: The method of forming a resin structure having a fine pattern comprises using a mold having a spigot structure in which a core is set so as to fit into a cavity, filling the cavity with a resin, and forming the resin under pressure. Accordingly, the structures of various resins having fine patterns can be mass-produced by simply making the mold having the spigot structure without the need of a special device. COPYRIGHT: (C)2009,JPO&INPIT