SEMICONDUCTOR DEVICE
PROBLEM TO BE SOLVED: To provide a semiconductor device having a MISFET structure where distortion is caused in a channel region by a method different from a conventional method. SOLUTION: The semiconductor device has a semiconductor substrate, an n-type MISFET having first source/drain regions and...
Gespeichert in:
1. Verfasser: | |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Schreiben Sie den ersten Kommentar!