POSITION DETECTION DEVICE, WAFER STACKING DEVICE, METHOD OF MANUFACTURING THREE-DIMENSIONAL LAMINATED SEMICONDUCTOR DEVICE, EXPOSURE DEVICE, AND METHOD OF MANUFACTURING DEVICE

PROBLEM TO BE SOLVED: To provide a position detection device having high focus adjusting function and high detection accuracy, and to provide a wafer stacking device and an exposure device having high performance, respectively. SOLUTION: The position detection device is characterized by including an...

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Bibliographische Detailangaben
1. Verfasser:	OTAKI TATSURO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TESTING
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Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a position detection device having high focus adjusting function and high detection accuracy, and to provide a wafer stacking device and an exposure device having high performance, respectively. SOLUTION: The position detection device is characterized by including an imaging lens 9 for forming an object M1 image on an imaging surface 10 based on a light flux acquired by an objective lens 6; a projection lens 16 for allowing a light flux from an index 15 to enter the object side of the imaging lens 9, and projecting an index 15 image onto the imaging surface 10 through the imaging lens 9; and a focusing mechanism for moving the objective lens 6 and the imaging lens 9 in the optical axis direction. COPYRIGHT: (C)2009,JPO&INPIT