MANUFACTURING METHOD FOR PHOTOPOLYMERIZATION PRODUCT LAYER

PROBLEM TO BE SOLVED: To provide a manufacturing method of a photopolymerization product layer with numerous microrecesses on the surface. SOLUTION: This manufacturing method of a photopolymerization product layer undergoes the following processes: first, a solvent which is non-miscible with a radic...

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1. Verfasser: NAGASAKI KUNIO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a manufacturing method of a photopolymerization product layer with numerous microrecesses on the surface. SOLUTION: This manufacturing method of a photopolymerization product layer undergoes the following processes: first, a solvent which is non-miscible with a radically polymerizable mixture or its prepolymerization product, is included in a photopolymerizable composition containing a radically polymerizable monomer mixture or its prepolymerization product and a photopolymerization initiator. Then, in this state, the photopolymerizable composition is photopolymerized to obtain a photopolymerization product layer. After that, numerous microrecesses are formed on the surface of the photopolymerization product layer by heating the photopolymerizaton product layer to the temperature level above the boiling point of the non-miscible solvent. It is preferable to include the non-miscible solvent in the photopolymerizable composition at the ratio of not less than 0.1 pts.wt. to not more than 50 pts.wt. to 100 pts.wt. of the radical polymerizable monomer mixture or its prepolymerization product. COPYRIGHT: (C)2009,JPO&INPIT