IMAGE DISPLAY DEVICE
PROBLEM TO BE SOLVED: To provide measures against defects of a photo process caused by exhaust holes formed at a cathode substrate in an FED (a field emission display). SOLUTION: Only a hole 101 is formed for a duct hole 10 formed at the cathode substrate 1 during the substrate 1 is subjected to a p...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | PROBLEM TO BE SOLVED: To provide measures against defects of a photo process caused by exhaust holes formed at a cathode substrate in an FED (a field emission display). SOLUTION: Only a hole 101 is formed for a duct hole 10 formed at the cathode substrate 1 during the substrate 1 is subjected to a photo process. 103 is chamfering. Therefore, a side where a film is formed on the cathode substrate 1 during the photo process is flat. After all the photo process is finished, a hole 102 is formed to make the duct hole to be a through-hole. In such a configuration, a resist is prevented from being collected in the duct hole 10 to cause various defects in the photo process. Further, since residues of a metal film or the like are not generated in the vicinity of the duct hole 10, a withstanding voltage of the display device can be improved. COPYRIGHT: (C)2009,JPO&INPIT |
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