ATMOSPHERE EXCHANGE METHOD

PROBLEM TO BE SOLVED: To provide an atmosphere exchange method of reducing the adhesion of particles to a substrate in a vacuum chamber. SOLUTION: There is provided a method for exchanging atmosphere of the vacuum chamber for a processor for processing a substrate in a vacuum environment. The method...

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1. Verfasser:	MOCHIZUKI SHINYA
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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